TYNK SILIKON PROTECT 031

KREISEL - Technika Budowlana Sp. z o.o

Revision date : 2021-06-06

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Health risk rating 4
Safety risk rating 3
Environmental risk rating 1

Note: Ingredients listed on restricted chemical lists

EC/CAS

236-675-5/13463-67-7

Name of the chemical

Reaction mass of titanium dioxide and silver chloride

Concentration

1-2.5%

EC/CAS

220-239-6/2682-20-4

Name of the chemical

2-Methyl-2H-isothiazol-3-one

Concentration

<0.0015%

EC/CAS

14808-60-7

Name of the chemical

Silica, crystalline

Concentration

N/A

EC/CAS

37244-96-5

Name of the chemical

nepheline syenite

Concentration

N/A

EC/CAS

12001-26-2

Name of the chemical

mica

Concentration

N/A

EC/CAS

215-279-6

Name of the chemical

Calcium carbonate

Concentration

50 - < 100%

General Information

Revision date

2021-06-06

Product name

TYNK SILIKON PROTECT 031

Icons in SDS

E003 M004 M009 M010 M016

Company Information

company name

KREISEL - Technika Budowlana Sp. z o.o

e-mail address of the competent person responsible for the Safety Data Sheet

poznan@kreisel.pl, bartosz.polaczyk@kreisel.pl

GHS Information

Signal word

Void

Section 2

CLP CLASSIFICATION

The product is not classified, according to the CLP regulation.

Additional information

The product contains encapsulated biocides. These only release a small part of the biocidal active ingredients. Based on the results of similar tested mixtures and applying the transfer principles according to EC 1272/2008 Article 9 (4), the product does not have to be classified as a skin sensitizer, see Section 16 Literature. EUH208 Contains 2-Methyl-2H-isothiazol-3-one. May produce an allergic reaction. EUH211 Warning! Hazardous respirable droplets may be formed when sprayed. Do not breathe spray or mist.

2.2 Label elements

Labelling according to Regulation (EC) No 1272/2008 Void

Hazard pictograms

Void

Signal word

Void

Hazard statements

Void

2.3 Other hazards

No further relevant information available.

PBT Substances

Not applicable

vPvB Substances

Not applicable *

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