SC 100 RESIST

FUJIFILM Electronic Materials (Europe) N.V

Revision date : 2007-01-30

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GHS07
Health risk rating 4
Safety risk rating 4
Environmental risk rating 5

Note: Ingredients listed on restricted chemical lists

EC/CAS

215-535-7/1330-20-7

Name of the chemical

Xylene

Concentration

55-75%

Listed in

EC/CAS

202-849-4/100-41-4

Name of the chemical

Ethylbenzene

Concentration

12-18%

Listed in

General Information

Revision date

2007-01-30

Product name

SC 100 RESIST

1.2.1 Relevant identified uses

Negative photoresist 2

supplier name

FUJIFILM Electronic Materials (Europe) N.V

Emergency telephone

+32-(0)14-58.45.45, +32-(0)3-250.05.11, +32-(0)3-252.46.31

Icons in SDS

Company Information

company name

FUJIFILM Electronic Materials (Europe) N.V

GHS Information

Signal word

Warning

Section 2

SECTION 2: Hazards identification

The product has been classified according to the legislation in force.

2.1 Classification of the substance or mixture

R10 | Xn; R20/21 | Xi; R38 The full text for all R-Phrases are displayed in section 16.

Potential health effects

Inhalation: Harmful by inhalation. Vapours may irritate throat and respiratory system and cause coughing. Vapours may cause drowsiness and dizziness. Eye contact: May irritate and cause redness and pain. Skin contact: Harmful in contact with skin. Irritating to skin. Prolonged contact may cause dryness of the skin. The product contains components which may penetrate skin. Ingestion: May irritate and cause malaise.

Other Health Effects

Organic solvents may be absorbed into the body by inhalation and cause permanent damage to the nervous system, including the brain. Exposure over a long period of time may cause damage to the liver and kidneys. Ethylbenzene: Possible human cancer hazard. Potential physical / chemical effects: The product is flammable, and heating may generate vapours which may form DATA explosive vapour/air mixtures.

Environmental hazards

The product contains volatile, organic compounds which have a photochemical ozone creation potential.

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