Note: Ingredients listed on restricted chemical lists
EC/CAS
231-633-2/7664-38-2
Name of the chemical
phosphoric acid
Concentration
25-<50%
General Information
Revision date
2018-03-28
Product name
CONTEC etching gel
CAS No.
7664-38-2
Emergency telephone
07 00 - 16 15 (Mo - Do), 07 00 - 13 15 (Fr
Icons in SDS
Company Information
company name
DENTAURUM GmbH & Co. KG
e-mail address of the competent person responsible for the Safety Data Sheet
info@dentaurum.de
GHS Information
Signal word
Danger
Hazard Codes
Hazard statements (CLP)
H314
Hazard statements
Code
Statements
H314
Causes severe skin burns and eye damage
Section 2
2.1 Classification of the substance or mixture
Regulation (EC) No. 1272/2008
Hazard categories
Skin corrosion/irritation: Skin Corr. 1B
Hazard statements
Causes severe skin burns and eye damage. H314 Causes severe skin burns and eye damage.
2.2 Label elements
Regulation (EC) No. 1272/2008
Hazardous Ingredients
Phosphoric acid ... %; orthophosphoric acid
Signal word
Danger
Precautionary statements
P405 Store locked up. P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. P303+P361+P353 IF ON SKIN (or hair): Take off immediately all contaminated clothing. Rinse skin with water or shower. P301+P330+P331 IF SWALLOWED: Rinse mouth. Do NOT induce vomiting. P304+P340 IF INHALED: Remove person to fresh air and keep comfortable for breathing. P363 Wash contaminated clothing before reuse. P310 Immediately call a POISON CENTER/doctor. P280 Wear protective gloves/protective clothing/eye protection/face protection. P264 Wash Water thoroughly after handling. P260 Do not breathe dust/fume/gas/mist/vapours/spray.
Supplemental label elements
As a medical device that is invasive or used in direct physical contact with the human body, the product is exempted from classification and labeling according to the Directive EC 1272/2008 (CLP) (Art. 1.5.d). Please see the indications in further chapters.
2.3 Other hazards
No information available.